Percorrer por autor "Feurer, Roselyne"
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- [Ir(m-SC(CH3)3)(CO)2]2: um novo precursor de irídio para a produção de filmes por OMCVD sobre substratos de grafitePublication . Gomes, Helder; Faria, Joaquim; Figueiredo, José; Feurer, Roselyne; Kalck, Philippe; Serp, PhilippeAs deposições de metais nobre, especialmente Pt, Pd, Rh e Ir obtidas por Deposição Química em fase Vapor (CVD) sobre o suporte adequado são muito interessantes, devido à baixa resistividade e elevada estabilidade térmica dos materiais resultantes.
- A new OMCVD iridium precursor for thin film depositionPublication . Serp, Philippe; Feurer, Roselyne; Kalck, Philippe; Gomes, Helder; Faria, Joaquim; Figueiredo, JoséA new one step synthesis of a volatile iridium OMCVD precursor with 60 % yield is described. Using the precursor [Ir(-SC(CH3)3)(CO)2]2 (see Figure), it is possible to obtain iridium of high purity. TGA/DTA analyses indicate that the precursor melts at 128 °C and starts to decompose at 160 °C. SEM analysis reveals that films deposited above 300 °C have a lamellar morphology while nodular morphology was obtained below 250 °C.
- Tetracarbonyl bis(m-(2-methyl-2-propane-thiolato))diiridium): a new CVD iridium precursor for thin film deposition on carbonPublication . Gomes, Helder; Faria, Joaquim; Figueiredo, José; Feurer, Roselyne; Kalck, Philippe; Serp, PhilippeDeposits of noble metal and particularly Pt, Pd, Rh or Ir prepared by Chemical Vapor Deposition (CVO) are of special interest because of their low resistivity and high termal stability. The major application is in microelectronics where they can replace gold as interconnects and contacts; other potential applications include protective coatings, gas sensors and catalysts. Among the noble metals cited above, iridium has been the subject of only a few studies, and suitable CVO precursors (i.e. volatile, easily synthesized, thermally stable during gas phase transport, characterized by a clean decomposition and non toxic) are relatively scarce.